Low-pressure OH radicals reactor generated by dielectric barrier discharge from water vapor

doi:10.1063/5.0006191

HFCAS OpenIR

	Low-pressure OH radicals reactor generated by dielectric barrier discharge from water vapor
	Wang, Li 1; Deng, LunHua 1; Li, Bao 1; Fang, Bo 2; Zhao, WeiXiong2 ; Xu, HuaiLiang 1,3
	2020-06-01
发表期刊	PHYSICS OF PLASMAS
ISSN	1070-664X
通讯作者	Deng, LunHua(lhdeng@phy.ecnu.edu.cn)
摘要	Hydroxyl (OH) radicals were generated by dielectric barrier discharge (DBD) from water vapor in a multi-pass cell with a volume of 8000cm(3). The cell was filled with the following water vapor at reduced pressure. The absolute OH number density was accurately determined by direct absorption spectroscopy using a tunable laser operating at 2.8 mu m. The absolute OH number density was around 10(12) molecules/cm(3). Helium, methane, ethane, propane, and carbon monoxide were respectively introduced into the multi-pass cell to study their influences on the OH number density. The decay rate of OH number density was directly related to the reaction rates of the added gases. The low-pressure DBD OH multi-pass cell can be used as a reactor to further study the reaction kinetics associated with OH radicals.
DOI	10.1063/5.0006191
关键词[WOS]	LASER-INDUCED FLUORESCENCE ; HYDROXYL RADICALS ; SPECTROSCOPY ; PHOTOPRODUCTION ; SYSTEM
收录类别	SCI
语种	英语
资助项目	National Natural Science Foundation of China (NSFC)[61625501] ; National Natural Science Foundation of China (NSFC)[61427816] ; Open Fund of the State Key Laboratory of High Field Laser Physics (SIOM) ; Open Fund of the State Key Laboratory of Precision Spectroscopy
项目资助者	National Natural Science Foundation of China (NSFC) ; Open Fund of the State Key Laboratory of High Field Laser Physics (SIOM) ; Open Fund of the State Key Laboratory of Precision Spectroscopy
WOS研究方向	Physics
WOS类目	Physics, Fluids & Plasmas
WOS记录号	WOS:000538130300001
出版者	AMER INST PHYSICS
引用统计	被引频次：2[WOS] [WOS记录] [WOS相关记录]
文献类型	期刊论文
条目标识符	http://ir.hfcas.ac.cn:8080/handle/334002/103066
专题	中国科学院合肥物质科学研究院
通讯作者	Deng, LunHua
作者单位	1.East China Normal Univ, State Key Lab Precis Spect, 3663 Zhongshan Rd N, Shanghai 200062, Peoples R China 2.Chinese Acad Sci, Anhui Inst Opt & Fine Mech, Lab Atmospher Phys Chem, Hefei 230031, Anhui, Peoples R China 3.Jilin Univ, Coll Elect Sci & Engn, State Key Lab Integrated Optoelect, Changchun 130012, Peoples R China
推荐引用方式 GB/T 7714	Wang, Li,Deng, LunHua,Li, Bao,et al. Low-pressure OH radicals reactor generated by dielectric barrier discharge from water vapor[J]. PHYSICS OF PLASMAS,2020,27.
APA	Wang, Li,Deng, LunHua,Li, Bao,Fang, Bo,Zhao, WeiXiong,&Xu, HuaiLiang.(2020).Low-pressure OH radicals reactor generated by dielectric barrier discharge from water vapor.PHYSICS OF PLASMAS,27.
MLA	Wang, Li,et al."Low-pressure OH radicals reactor generated by dielectric barrier discharge from water vapor".PHYSICS OF PLASMAS 27(2020).