Mass Deposition, Etching and Sputtering Effects of Low-Energy N+ Ion Irradiation on Solid Fly Ash

	Mass Deposition, Etching and Sputtering Effects of Low-Energy N+ Ion Irradiation on Solid Fly Ash
	Miao CG(苗春光); Wang XQ(王相勤)
	2013
发表期刊	plasma science and technology
WOS记录号	WOS:000329977500013
引用统计
文献类型	期刊论文
条目标识符	http://ir.hfcas.ac.cn:8080/handle/334002/12444
专题	技术生物与农业工程研究所
推荐引用方式 GB/T 7714	Miao CG,Wang XQ. Mass Deposition, Etching and Sputtering Effects of Low-Energy N+ Ion Irradiation on Solid Fly Ash[J]. plasma science and technology,2013,15(12).
APA	苗春光,&王相勤.(2013).Mass Deposition, Etching and Sputtering Effects of Low-Energy N+ Ion Irradiation on Solid Fly Ash.plasma science and technology,15(12).
MLA	苗春光,et al."Mass Deposition, Etching and Sputtering Effects of Low-Energy N+ Ion Irradiation on Solid Fly Ash".plasma science and technology 15.12(2013).