Institutional Repository of Anhui Institute of Optics and Fine Mechanics, Hefei Institutes of Physical Science, Chinese Academy of Sciences, Hefei, Anhui 230031, China
Analysis of damage threshold of K9 glass irradiated by 248-nm KrF excimer laser | |
Wang, Xi1,2,3; Shao, Jingzhen1; Li, Hua3; Nie, Jinsong3; Fang, Xiaodong1 | |
2016-02-01 | |
发表期刊 | OPTICAL ENGINEERING |
摘要 | The theoretical model of K9 glass irradiated by a 248-nm KrF excimer laser was established, and a numerical simulation was performed to calculate temperature and thermal stress fields in the K9 glass sample using the finite element method. The laser-induced damage thresholds were defined and calculated, and the effect of repetition frequency and the number of pulses on the damage threshold were also studied. Furthermore, the experiment research was carried out to confirm the numerical simulation. The damage threshold and damage morphology were analyzed by means of a metallurgical microscope and scanning electron microscopy. The simulation and experimental results indicated that the damage mechanism of K9 glass irradiated by a KrF excimer laser was melting damage and stress damage, and the stress damage first appeared inside the K9 glass sample. The tensile stress damage threshold, the compressive stress damage threshold, and the melting damage threshold were 0.64, 0.76, and 1.05 J/cm(2), respectively. The damage threshold decreased with increasing repetition frequency and number of laser pulses. The experimental results indicated that the damage threshold of K9 glass was 2.8 J/cm(2). (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE) |
文章类型 | Article |
关键词 | Excimer Laser Laser-induced Damage Threshold Damage Morphology K9 Glass Numerical Simulation |
WOS标题词 | Science & Technology ; Physical Sciences |
DOI | 10.1117/1.OE.55.2.027102 |
关键词[WOS] | SILICA |
收录类别 | SCI |
语种 | 英语 |
项目资助者 | National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) |
WOS研究方向 | Optics |
WOS类目 | Optics |
WOS记录号 | WOS:000371283600045 |
引用统计 | |
文献类型 | 期刊论文 |
条目标识符 | http://ir.hfcas.ac.cn:8080/handle/334002/21478 |
专题 | 中科院安徽光学精密机械研究所 |
作者单位 | 1.Chinese Acad Sci, Hefei Inst Phys Sci, Hefei 230031, Peoples R China 2.Univ Sci & Technol China, Hefei 230029, Peoples R China 3.Inst Elect Engn, State Key Lab Pulsed Power Laser Technol, Hefei 230037, Peoples R China |
推荐引用方式 GB/T 7714 | Wang, Xi,Shao, Jingzhen,Li, Hua,et al. Analysis of damage threshold of K9 glass irradiated by 248-nm KrF excimer laser[J]. OPTICAL ENGINEERING,2016,55(2):027102. |
APA | Wang, Xi,Shao, Jingzhen,Li, Hua,Nie, Jinsong,&Fang, Xiaodong.(2016).Analysis of damage threshold of K9 glass irradiated by 248-nm KrF excimer laser.OPTICAL ENGINEERING,55(2),027102. |
MLA | Wang, Xi,et al."Analysis of damage threshold of K9 glass irradiated by 248-nm KrF excimer laser".OPTICAL ENGINEERING 55.2(2016):027102. |
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