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Analysis of damage threshold of K9 glass irradiated by 248-nm KrF excimer laser
Wang, Xi1,2,3; Shao, Jingzhen1; Li, Hua3; Nie, Jinsong3; Fang, Xiaodong1
2016-02-01
发表期刊OPTICAL ENGINEERING
摘要The theoretical model of K9 glass irradiated by a 248-nm KrF excimer laser was established, and a numerical simulation was performed to calculate temperature and thermal stress fields in the K9 glass sample using the finite element method. The laser-induced damage thresholds were defined and calculated, and the effect of repetition frequency and the number of pulses on the damage threshold were also studied. Furthermore, the experiment research was carried out to confirm the numerical simulation. The damage threshold and damage morphology were analyzed by means of a metallurgical microscope and scanning electron microscopy. The simulation and experimental results indicated that the damage mechanism of K9 glass irradiated by a KrF excimer laser was melting damage and stress damage, and the stress damage first appeared inside the K9 glass sample. The tensile stress damage threshold, the compressive stress damage threshold, and the melting damage threshold were 0.64, 0.76, and 1.05 J/cm(2), respectively. The damage threshold decreased with increasing repetition frequency and number of laser pulses. The experimental results indicated that the damage threshold of K9 glass was 2.8 J/cm(2). (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
文章类型Article
关键词Excimer Laser Laser-induced Damage Threshold Damage Morphology K9 Glass Numerical Simulation
WOS标题词Science & Technology ; Physical Sciences
DOI10.1117/1.OE.55.2.027102
关键词[WOS]SILICA
收录类别SCI
语种英语
项目资助者National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; National Science and Technology Major Project (China)(2013ZX02202004) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03) ; Foundation of the State Key Laboratory of Pulsed Power Laser Technology (China)(SKL2014ZR03)
WOS研究方向Optics
WOS类目Optics
WOS记录号WOS:000371283600045
引用统计
被引频次:10[WOS]   [WOS记录]     [WOS相关记录]
文献类型期刊论文
条目标识符http://ir.hfcas.ac.cn:8080/handle/334002/21478
专题中科院安徽光学精密机械研究所
作者单位1.Chinese Acad Sci, Hefei Inst Phys Sci, Hefei 230031, Peoples R China
2.Univ Sci & Technol China, Hefei 230029, Peoples R China
3.Inst Elect Engn, State Key Lab Pulsed Power Laser Technol, Hefei 230037, Peoples R China
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Wang, Xi,Shao, Jingzhen,Li, Hua,et al. Analysis of damage threshold of K9 glass irradiated by 248-nm KrF excimer laser[J]. OPTICAL ENGINEERING,2016,55(2):027102.
APA Wang, Xi,Shao, Jingzhen,Li, Hua,Nie, Jinsong,&Fang, Xiaodong.(2016).Analysis of damage threshold of K9 glass irradiated by 248-nm KrF excimer laser.OPTICAL ENGINEERING,55(2),027102.
MLA Wang, Xi,et al."Analysis of damage threshold of K9 glass irradiated by 248-nm KrF excimer laser".OPTICAL ENGINEERING 55.2(2016):027102.
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