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Influence of sputtering power on the phase transition performance of VO2 thin films grown by magnetron sputtering
Luo, Y. Y.; Pan, S. S.; Xu, S. C.; Zhong, L.; Wang, H.; Li, G. H.
2016-04-15
Source PublicationJOURNAL OF ALLOYS AND COMPOUNDS
Volume664Issue:Pages:626-631
AbstractThe influence of sputtering power on the electrical and infrared properties of VO2 thin films was investigated. It was found that the controlling of sputtering power is very important in realizing the pure VO2 (M) thin film. The thin films grown at the sputtering powers of 350 W and above have a similar phase transition behavior to bulk VO2. The infrared transmittance and electrical resistance of the VO2 thin film also depend on the sputtering power, and the hysteresis width is controlled by the size effect. The film thickness and defect density affect the amplitudes of the phase transition and phase transition temperature. (C) 2015 Elsevier B.V. All rights reserved.
SubtypeArticle
KeywordVo2 Thin Film Sputtering Power Phase Transition Electrical Resistance Infrared Transmittance Switching Performance
WOS HeadingsScience & Technology ; Physical Sciences ; Technology
Funding OrganizationNational Natural Science Foundation of China(51471163 ; National Natural Science Foundation of China(51471163 ; 11104270) ; 11104270) ; National Natural Science Foundation of China(51471163 ; National Natural Science Foundation of China(51471163 ; 11104270) ; 11104270)
DOI10.1016/j.jallcom.2015.12.222
WOS KeywordVANADIUM DIOXIDE ; ELECTRICAL-PROPERTIES ; PRESSURE ; COATINGS ; DESIGN ; WINDOW
Indexed BySCI
Language英语
Funding OrganizationNational Natural Science Foundation of China(51471163 ; National Natural Science Foundation of China(51471163 ; 11104270) ; 11104270) ; National Natural Science Foundation of China(51471163 ; National Natural Science Foundation of China(51471163 ; 11104270) ; 11104270)
WOS Research AreaChemistry ; Materials Science ; Metallurgy & Metallurgical Engineering
WOS SubjectChemistry, Physical ; Materials Science, Multidisciplinary ; Metallurgy & Metallurgical Engineering
WOS IDWOS:000369061700081
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Document Type期刊论文
Identifierhttp://ir.hfcas.ac.cn:8080/handle/334002/22109
Collection中科院固体物理研究所
AffiliationChinese Acad Sci, Inst Solid State Phys, Key Lab Mat Phys, Anhui Key Lab Nanomat & Nanostruct, Hefei 230031, Peoples R China
Recommended Citation
GB/T 7714
Luo, Y. Y.,Pan, S. S.,Xu, S. C.,et al. Influence of sputtering power on the phase transition performance of VO2 thin films grown by magnetron sputtering[J]. JOURNAL OF ALLOYS AND COMPOUNDS,2016,664(无):626-631.
APA Luo, Y. Y.,Pan, S. S.,Xu, S. C.,Zhong, L.,Wang, H.,&Li, G. H..(2016).Influence of sputtering power on the phase transition performance of VO2 thin films grown by magnetron sputtering.JOURNAL OF ALLOYS AND COMPOUNDS,664(无),626-631.
MLA Luo, Y. Y.,et al."Influence of sputtering power on the phase transition performance of VO2 thin films grown by magnetron sputtering".JOURNAL OF ALLOYS AND COMPOUNDS 664.无(2016):626-631.
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