Synthesis of carbon nanotubes by microwave plasma chemical vapor deposition at low temperature

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	Synthesis of carbon nanotubes by microwave plasma chemical vapor deposition at low temperature
其他题名	Synthesis of Carbon Nanotubes by Microwave Plasma Chemical Vapor Deposition at Low Temperature
	2002
发表期刊	ACTA CHIMICA SINICA
ISSN	0567-7351
摘要	Carbon nanotubes are novel materials with unique electrical and mechanical properties. Most of the natures of carbon nanotubes depend on their diameters and chiralities. However, it is very difficult to control the diameter and chirality of carbon nanotubes at high temperatures, and thus limits prospects of the nanotubes. For instance, one of the most promising applications of carbon nanotubes in the future is flat panel display, but the carbon nanotubes synthesized at high temperatures is not useable for this purpose because the strain point of glass is very low. For these reasons, synthesis of carbon nanotubes at low temperatures has become a challenge and received much attention. Among all the procedures for synthesizing nanotubes, chemical vapor deposition, especially plasma chemical vapor deposition (PCVD), has great potential in synthesizing carbon nanotubes at low temperatures. In this paper, cobalt nanoparticles supported by SiO2 was prepared by sol-gel process and plasma reducing process. Using methane as carbon resource, hydrogen as carrier, carbon nanotubes were synthesized by microwave plasma chemical vapor deposition ( MWPCVD) at temperatures above 460 degreesC but below 500 degreesC under the catalytic effect of cobalt supported by SiO2. During the process of nanotubes growth, the total pressure in the chamber was kept at 2 kPa. The microwave plasma input power was 600 W, with the flow rates of H-2 and CH4 being 80 and 5 similar to 20 seem, respectively. Though some other carbonaceous particles were also deposited and attached on the carbon nanotubes when the flow rate of CH4 was 20 seem, the amount of carbonaceous particles decreased with the decrease of the flow rate of CH4. These results demonstrate that MWPCVD is a very efficient process for the synthesis of carbon nanotubes at low temperatures.
关键词	ARRAYS carbon nanotubes microwave plasma chemical vapor deposition synthesis at low temperature
收录类别	CSCD
语种	英语
CSCD记录号	CSCD:1009184
引用统计	被引频次：7[CSCD] [CSCD记录]
文献类型	期刊论文
条目标识符	http://ir.hfcas.ac.cn:8080/handle/334002/59653
专题	中国科学院合肥物质科学研究院
推荐引用方式 GB/T 7714	. Synthesis of carbon nanotubes by microwave plasma chemical vapor deposition at low temperature[J]. ACTA CHIMICA SINICA,2002,60.
APA	(2002).Synthesis of carbon nanotubes by microwave plasma chemical vapor deposition at low temperature.ACTA CHIMICA SINICA,60.
MLA	"Synthesis of carbon nanotubes by microwave plasma chemical vapor deposition at low temperature".ACTA CHIMICA SINICA 60(2002).