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Annealing temperature-dependent microstructure and optical and electrical properties of solution-derived Gd-doped ZrO2 high-k gate dielectrics 期刊论文
JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, 2017, 卷号: 83, 期号: 3, 页码: 675-682
Authors:  Zhu, L.;  He, G.;  Sun, Z. Q.;  Liu, M.;  Jiang, S. S.;  Liang, S.;  Li, W. D.
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Gd-doped Zro2 Gate Dielectric Thin Films  Annealing Temperature  Sol-gel  Optical Properties  Electrical Properties  
Interfacial modulation and electrical properties improvement of solution-processed ZrO2 gate dielectrics upon Gd incorporation 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 699, 期号: 无, 页码: 415-420
Authors:  Xiao, D. Q.;  He, G.;  Lv, J. G.;  Wang, P. H.;  Liu, M.;  Gao, J.;  Jin, P.;  Jiang, S. S.;  Li, W. D.;  Sun, Z. Q.
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High-k Gate Dielectrics  Gd Incorporation  Xps  Electrical Properties  Sol-gel  
Reducing the interfacial reaction between borosilicate sealant and yttria-stabilized zirconia electrolyte by addition of HfO2 期刊论文
Journal of the European Ceramic Society, 2015, 卷号: 35, 期号: 8, 页码: 2427-2431
Authors:  Shunrun Chen;  Zhiwu Yu;  Qi Zhang;  Junping Wang;  Teng Zhang;  Junfeng Wang
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Integrations and challenges of novel high-k gate stacks in advanced CMOS technology 期刊论文
PROGRESS IN MATERIALS SCIENCE, 2011, 卷号: 56, 期号: 5
Authors:  He, G;  Zhu, LQ;  Sun, ZQ;  Wan, Q;  Zhang, LD
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掺氮氧化钇氧化铪高介电栅介质薄膜氮含量的调控及性能优化研究 学位论文
, 北京: 中国科学院研究生院, 2010
Authors:  王秀娟
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磁控溅射薄膜制备及改性研究 学位论文
, 北京: 中国科学院研究生院, 2009
Authors:  张晋平
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锆基高介电常数栅介质薄膜的制备及物性研究 学位论文
, 北京: 中国科学院研究生院, 2007
Authors:  竺立强
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铋基氧化物与合金薄膜的制备和物性研究 学位论文
, 北京: 中国科学院研究生院, 2006
Authors:  范洪涛
Adobe PDF(5260Kb)  |  Favorite  |  View/Download:3/1  |  Submit date:2013/09/29
高介电常数栅介质薄膜的制备及物性研究 学位论文
, 北京: 中国科学院研究生院, 2006
Authors:  何刚
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