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Annealing-induced evolution in interface stability and electrical performance of sputtering-driven rare-earth-based gate oxides 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2019, 卷号: 778, 期号: 无, 页码: 579-587
Authors:  Wang, Die;  He, Gang;  Liang, Shuang;  Liu, Mao
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Dy2O3 gate dielectrics  High-k  Annealing temperature  Optical properties  Electrical characteristics  
Porous AAO template-assisted rational synthesis of large-scale 1D hybrid and hierarchically branched nanoarchitectures 期刊论文
PROGRESS IN MATERIALS SCIENCE, 2018, 卷号: 95, 期号: 无, 页码: 243-285
Authors:  Xu, Qiaoling;  Meng, Guowen;  Han, Fangming
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Hybrid nanostructures  Branched nanostructures  Anodic aluminum oxide  Template-assisted synthesis  
Interface Modulation and Optimization of Electrical Properties of HfGdO/GaAs Gate Stacks by ALD-Derived Al2O3 Passivation Layer and Forming Gas Annealing 期刊论文
ADVANCED ELECTRONIC MATERIALS, 2018, 卷号: 4, 期号: 4, 页码: 9
Authors:  Jiang, Shanshan;  He, Gang;  Liu, Mao;  Zhu, Li;  Liang, Shuang;  Li, Wendong;  Sun, Zhaoqi;  Tian, Mingliang
View  |  Adobe PDF(2151Kb)  |  Favorite  |  View/Download:13/3  |  Submit date:2019/06/10
electrical properties  forming gas annealing  high-k gate dielectrics  interface chemistry  metal-oxide-semiconductor capacitors  
Ultrathin GaGeTe p-type transistors 期刊论文
APPLIED PHYSICS LETTERS, 2017, 卷号: 111, 期号: 20, 页码: 3
Authors:  Wang, Weike;  Li, Liang;  Zhang, Zhitao;  Yang, Jiyong;  Tang, Dongsheng;  Zhai, Tianyou
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高性能半导体聚合物分子取向和薄膜结构的调控及其电荷输运特性研究 学位论文
, 合肥: 中国科学技术大学, 2017
Authors:  潘国兴
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Interface chemistry and electronic structure of ALD-derived HfAlO/Ge gate stacks revealed by X-ray photoelectron spectroscopy 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 716, 期号: 无, 页码: 1-6
Authors:  He, Gang;  Jiang, Shanshan;  Li, Wendong;  Zheng, Changyong;  He, Huaxin;  Li, Jing;  Sun, Zhaoqi;  Liu, Yanmei;  Liu, Mao
View  |  Adobe PDF(1886Kb)  |  Favorite  |  View/Download:16/6  |  Submit date:2018/05/25
High-k Gate Dielectric  Atomic-layer-deposition  Interface Stability  Phase Separation  Annealing Temperature  
Annealing temperature-dependent microstructure and optical and electrical properties of solution-derived Gd-doped ZrO2 high-k gate dielectrics 期刊论文
JOURNAL OF SOL-GEL SCIENCE AND TECHNOLOGY, 2017, 卷号: 83, 期号: 3, 页码: 675-682
Authors:  Zhu, L.;  He, G.;  Sun, Z. Q.;  Liu, M.;  Jiang, S. S.;  Liang, S.;  Li, W. D.
Favorite  |  View/Download:7/0  |  Submit date:2018/08/16
Gd-doped Zro2 Gate Dielectric Thin Films  Annealing Temperature  Sol-gel  Optical Properties  Electrical Properties  
Modulation of interfacial and electrical properties of HfGdO/GaAs gate stacks by ammonium sulfide passivation and rapid thermal annealing 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 卷号: 704, 期号: 无, 页码: 322-328
Authors:  Jiang, S. S.;  He, G.;  Liang, S.;  Zhu, L.;  Li, W. D.;  Zheng, C. Y.;  Lv, J. G.;  Liu, M.
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High-k Gate Dielectrics  Interface Chemistry  Xps Electrical Properties  Cmos Devices  
Effect of gate voltage polarity on the ionic liquid gating behavior of NdNiO3/NdGaO3 heterostructures 期刊论文
APL MATERIALS, 2017, 卷号: 5, 期号: 5, 页码: 1-7
Authors:  Dong, Yongqi;  Xu, Haoran;  Luo, Zhenlin;  Zhou, Hua;  Fong, Dillon D.;  Wu, Wenbin;  Gao, Chen
View  |  Adobe PDF(3796Kb)  |  Favorite  |  View/Download:11/5  |  Submit date:2018/05/25
基于 EPICS伺服电源控制器的研制 学位论文
, 北京: 中国科学院研究生院, 2017
Authors:  段吟池
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