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Annealing-temperature-modulated optical, electrical properties, and leakage current transport mechanism of sol-gel-processed high-k HfAlOX gate dielectrics 期刊论文
CERAMICS INTERNATIONAL, 2017, 卷号: 43, 期号: 3, 页码: 3101-3106
作者:  Jin, P.;  He, G.;  Fang, Z. B.;  Liu, M.;  Xiao, D. Q.;  Gao, J.;  Jiang, S. S.;  Li, W. D.;  Sun, Z. Q.;  Zhang, M.
浏览  |  Adobe PDF(972Kb)  |  收藏  |  浏览/下载:107/56  |  提交时间:2018/07/04
High-k Hfalox Gate Dielectrics  Sol-gel  Optical Properties  Electrical Properties  Leakage Current Transport Mechanism  
Baking-temperature-modulated optical and electrical properties of HfTiOx gate dielectrics via sol-gel method 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2016, 卷号: 688, 期号: 无, 页码: 925-932
作者:  Jin, P.;  He, G.;  Wang, P. H.;  Liu, M.;  Xiao, D. Q.;  Gao, J.;  Chen, H. S.;  Chen, X. S.;  Sun, Z. Q.;  Zhang, M.;  Lv, J. G.;  Liu, Y. M.
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High-k Gate Dielectrics  Hftiox Thin Films  Sol-gel Processing  Optical Properties  Electrical Properties  
Microstructure, optical and electrical properties of sputtered HfFiO high-k gate dielectric thin films 期刊论文
CERAMICS INTERNATIONAL, 2016, 卷号: 42, 期号: 10, 页码: 11640-11649
作者:  Jiang, S. S.;  He, G.;  Gao, J.;  Xiao, D. Q.;  Jin, P.;  Li, W. D.;  Lv, J. G.;  Liu, M.;  Liu, Y. M.;  Sun, Z. Q.
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Electrical Properties  High-k Gate Dielectrics  Metal-oxide-semiconductor  Conduction Mechanisms  Sputtering  
Microstructure, wettability, optical and electrical properties of HfO2 thin films: Effect of oxygen partial pressure 期刊论文
JOURNAL OF ALLOYS AND COMPOUNDS, 2016, 卷号: 662, 期号: 无, 页码: 339-347
作者:  Gao, J.;  He, G.;  Deng, B.;  Xiao, D. Q.;  Liu, M.;  Jin, P.;  Zheng, C. Y.;  Sun, Z. Q.
浏览  |  Adobe PDF(3787Kb)  |  收藏  |  浏览/下载:62/35  |  提交时间:2017/10/18
Hfo2 Thin Films  Rf Sputtering  Optical Properties  Band Gap  Wettability